Plasma-Therm, established in 1974, is a leading provider of plasma etch and deposition systems for research and production applications. Their innovative technologies, such as ICP, RIE, DSE, PECVD, and HDPCVD, cater to various industries including die singulation, solid state lighting, wireless communication, MEMS/NEMS, data storage, renewable energy, nanotechnology, photomask, and photonics.
With a strong focus on cutting-edge solutions, Plasma-Therm's systems are utilized in a wide range of sectors, from semiconductor manufacturing to advanced materials development. Their commitment to excellence and versatility has solidified their reputation as a trusted partner for organizations seeking high-performance plasma processing equipment.
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